ISSTT Proceedings

ISSTT Proceedings

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Terahertz waveguide mixer development with micromachining and DRIE

Authors:
P. Pütz, T. Tils, K. Jacobs, C. E. Honingh
Abstract:
Simple waveguide mixers have been fabricated up to 1.9 THz in traditional technology. Advanced mixer concepts such as sideband separation or balancing demand more complicated and precise waveguide technology. Mixer development at KOSMA is based on a dual fabrication technology approach. On the one hand we have extended our traditional, CNC lathe based, metal micro machining capabilities. We will present micro milling results of 490 GHz waveguide couplers with ±5 µm precision. On the other hand deep reactive-ion etching (DRIE) of silicon for fabricating waveguides as a new, very powerful technology is explored. This will be demonstrated with successfully fabricated 1.9 THz waveguide structures. Feature reproducibility, given by the photolithography based processes, is ±1 µm, which is sufficiently precise up to frequencies of 10 THz. Features with two different etch depths, such as a waveguide with substrate channel, have been successfully fabricated by using a dual masking scheme.
Categories:
Components, Poster Session
Year:
2005
Session:
5F
Full-text:
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Page Number(s):
338-342